NanoFraction optical metrology

Measure what your process is hiding.

NanoFraction combines non-destructive optical capture, computational reconstruction and application-specific validation to expose structure, defects and process signals that conventional inspection can miss.

Explore use cases Discuss a sample
Non-destructive capturePreserve the sample and its context.
Application-specific calibrationEngineer the optics around the decision.
Decision-ready outputsTurn images into maps, metrics and evidence.
Four operating problems

Choose the workflow closest to yours.

Each use case starts with the same question: what must be measured for the next decision to become faster, clearer or more defensible?

Optical defect map of a diamond wafer with identified dislocation features 01
Diamond

Diamond wafer characterization

Locate dislocations and connect surface signatures with roughness, bending, stress and three-dimensional topography—without sacrificing the wafer.

  • Defect location
  • 3D topography
  • Stress signatures
  • Wafer-scale context
View the diamond use case
Optical field measurement of repeating structures on a DRAM die 02
DRAM

Optical metrology across scales

Move from millimeter-scale die architecture toward candidate cell-scale periodic signatures while keeping the result tied to the physical layout and its uncertainty.

  • Die-to-cell workflow
  • Periodic signatures
  • Phase analysis
  • Layout correlation
View the DRAM use case
Rare-earth mineral particles prepared for process microscopy analysis 03
Rare-earth processing

Earlier signals from wet streams

Use optical particle and texture measurements to investigate fines, dewatering, entrainment and tailings value—then correlate those signals with the reference assays that matter.

  • Particle populations
  • Texture features
  • Process trends
  • Assay correlation
View the REE use case
Structured-light inspection setup measuring features on a textile garment 04
Textiles

Large-area structured-light inspection

Detect, size and map subtle garment features across a large field while preserving full-frame context and explicitly rejecting off-region false positives.

  • Defect detection
  • Feature sizing
  • ROI validation
  • Full-frame traceability
View the textile use case
One adaptable architecture

The principle scales. The instrument is engineered.

Moiré and structured-field measurement principles are scale-independent in architecture—not in implementation. Every application still needs the right wavelength, field of view, numerical aperture, carrier, calibration, sample handling and reference method.

01 / FRAME

Define the decision.

Start with the defect, structure or process signal that changes an operating choice.

02 / CAPTURE

Build the optical interaction.

Select illumination, carrier, magnification and field geometry for the material and scale.

03 / COMPUTE

Recover measurable structure.

Use phase, Fourier, topographic or AI-assisted analysis to extract candidate signals.

04 / VALIDATE

Prove the output matters.

Compare against trusted references and quantify repeatability, uncertainty and limits.

A practical engagement path

Services first. Hardware when the workflow is proven.

We begin with the measurement question and representative samples, then add complexity only when the evidence supports it.

STAGE 01

Feasibility

Define the decision, inspect representative samples and test whether the optical signal is present and repeatable.

STAGE 02

Correlation pilot

Compare outputs with your current metrology, inspection, assay or process history using explicit success gates.

STAGE 03

Embedded workflow

Package the method into a repeatable service, software pipeline or purpose-built measurement system.

Bring us one measurement bottleneck.

A sample, a reference result and the decision you need to make are enough to start.

Discuss your application